Macro Pattern Inspection Module | High-speed evaluation of dimensional changes at the nano level

Achieved a correlation R²=0.96 for the measured long SEM data. Quantitatively observed a wide range of chip pattern size variations as changes in image brightness.

last updated May 12, 2026

Macro inspection device | High-speed simultaneous detection of foreign substances, film unevenness, and defects on wafers.

Imaging 12-inch wafers in 7 seconds. With a unique optical system that captures defects without resolution, inspection time is shortened to one-fourth of the industry standard, enabling 100% inspection.

last updated May 12, 2026