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ウエハー凹凸検査
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Surface Roughness Visualization Unit | Capturing Nano-Level Crystal Defects at a Macro Scale
Visualizing minute changes of 3nm. By using an off-axis optical system and edge reflection light detection, we capture the distortion and scratches on the wafer surface in a wide area at once.
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Macro inspection device | High-speed simultaneous detection of foreign substances, film unevenness, and defects on wafers.
Imaging 12-inch wafers in 7 seconds. With a unique optical system that captures defects without resolution, inspection time is shortened to one-fourth of the industry standard, enabling 100% inspection.
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Surface Roughness Visualization Unit for Semiconductor Quality Control
Capture nano-level crystal defects at a macro scale to improve the accuracy of quality control.
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