Photo mask cleaning device (semi-auto)
It is a long-selling model with cumulative sales of over 200 units in the series.
■We boast a 90% market share in the domestic mask manufacturing industry. ■Ideal for "post-polishing cleaning," "incoming cleaning," and "final cleaning." ■We have extensive experience in "removing resist adhered during contact exposure" for device manufacturers. ■These are standard devices categorized by substrate size, but custom solutions are also available. ■The basic processing sequence is "detergent/scrub ⇒ DIW2 fluid ⇒ front and back rinse ⇒ spin dry." ◎The scrub and two-fluid processing feature a standard scan rotation function. ◎Excellent particle removal with the DIW2 fluid tool. ◎Scrub brushes can be selected based on the substrate surface condition: nylon brush or PVA brush. ■Various options are available to meet diverse needs. ◎<Automatic dilution of detergent><Self-ultrasonic cleaning of brushes><CO2 ionizer><MS cleaning> ■We have extensive experience in handling automatic transport processing devices for substrates. *For more details, please refer to the PDF document or feel free to contact us. Sheet-type cleaning devices, coating and developing devices, substrate cleaning devices, spin cleaning devices, semiconductor manufacturing devices, semiconductors, resist stripping devices, megasonic cleaning devices, cleaning devices, resist, photoresist, photolithography process, mask cleaning devices, wafer cleaning devices.
basic information
For more details, please refer to the PDF document or feel free to contact us.
Price range
Delivery Time
Applications/Examples of results
For more details, please refer to the PDF document or feel free to contact us.
