Post-CMP cleaning, post-polishing cleaning, mask cleaning
Post-CMP cleaning, post-polishing cleaning, mask cleaning
Our company handles a variety of equipment for post-CMP cleaning, post-polishing cleaning, and mask cleaning.
1～4 item / All 4 items
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Fully automatic batch processing equipment (substrate regeneration, etching, RCA cleaning, etc.)
High throughput, high reliability, low-cost batch processing equipment.
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New Type Semi-Automatic UDS Spin Sheet Device
Of course, RCA, development, etching, cleaning, stripping, lift-off, etc.! We have a wealth of experience in various process treatments.
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Small Multi-Spin Processor: Etching, Cleaning, Developing
During scanning, uniformity improvement through peripheral speed control is also possible! We have received numerous uses and have a wealth of experience compared to conventional methods.
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Tabletop spin cleaning device
You can achieve high cleaning performance equivalent to that of higher-end models.
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