Tabletop spin cleaning device
You can achieve high cleaning performance equivalent to that of higher-end models.
■ Ideal for "prototype development," "alternative to manual cleaning," "labor-saving," and "quality improvement," etc. ■ Unlike manual cleaning, it achieves a high level of surface quality without variation. ■ Achieves both improved base quality and reduced cleaning labor costs. ◎ For example, operating four tabletop cleaning machines with one worker at a low labor cost. ■ Optimal for processing Si, SiC, GaN, sapphire, GaAs, LT, etc. ■ Compatible with round substrates as well as square shapes like Cr masks. ◎ Max size: Φ20mm, 6 inches square. ■ The basic processing sequence is "detergent/scrub ⇒ DIW two-fluid ⇒ front and back rinse ⇒ spin dry." ◎ Scanning rotation function is standard during scrubbing and two-fluid processing. ◎ Excellent particle removal performance with the DIW two-fluid tool. ◎ Choose between nylon brush or PVA brush depending on the substrate surface condition. ■ Options available for <automatic detergent dilution unit> and <CO2 ionizer>. *For more details, please refer to the PDF document or feel free to contact us.*
basic information
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Price range
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Applications/Examples of results
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