Fully automatic batch processing equipment (substrate regeneration, etching, RCA cleaning, etc.)
High throughput, high reliability, low-cost batch processing equipment.
■ This is a cassette-type batch processing device. ■ Ideal for batch processing compatible with RCA processes such as APM/MS, SPM, HPM, and DHF. ■ Also supports substrate regeneration processes such as organic stripping and Poly-Si regeneration. ■ Proven capability for anisotropic etching such as MEMS. ■ Achievements up to 300mm. ■ Compatible with various drying units including S/D, IPA vapor drying, and hot water lift drying. ◎ The IPA vapor drying features a watermark suppression function. ■ For recent demands of "small quantity and diverse variety," we recommend the latest UDS spin processor as a spin single wafer. ◎ Throughput improvement is achieved by multi-chamber configuration of the UDS chamber. *For more details, please refer to the PDF document or feel free to contact us. Wafer, substrate cleaning equipment, semiconductor manufacturing equipment, semiconductor, resist stripping equipment, megasonic, low-cost, cleaning equipment, automatic cleaning machine, resist, batch cleaning equipment, silicon, etching equipment, RCA cleaning, insulating film, film formation, ceramic, loader unloader.
basic information
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