洗浄装置関連
洗浄装置関連
半導体製造プロセスの前工程において使用する洗浄装置を中心とした製品群のご紹介 ◆FOUP洗浄装置 ◆SMIF&カセット洗浄装置 ◆フォトマスク洗浄装置 縦型コンパクトタイプ ◆フォトマスク洗浄装置 PDP・大判用フォトマスク対応装置 ◆新型マスク洗浄装置 TWC-300 ◆紫外線オゾン洗浄装置 ◆スーパークリーンヒーター
1～7 件を表示 ／ 全 7 件
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Cleaning Device | Wafer Cassette and Carrier Cleaning Device "TCC-803"
A cleaning device designed for the precision cleaning of wafer cassettes, carriers, boxes, and other items used in the manufacturing process of high-end, high-value-added products.
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Photo Mask Cleaning Device | Vertical Compact Type TWE-200
A mask cleaner that performs scrubbing, rinsing, and drying all in one machine to clean dust and dirt attached to photomasks.
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Photo Mask Cleaning Device | Simple Type Mask Cleaning Device TWC-302
"Scrub washing + rinse" & "Hot pure water drying" two-tank simple mask cleaning device
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Photo Mask Cleaning Device | For PDP and Large Photo Masks TW-1000
From small size to large size, scrubbing, rinsing, and drying are all performed with one machine!
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Mask Cleaning Machine | Fully Automatic Mask Cleaning Device "TWC-200A"
Complete removal of particles larger than 1μm and resist residue attached to the mask all at once.
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Simple Mask Cleaning Device | Simple Cleaning Unit
The simple cleaning unit is a basic cleaning unit that can accommodate mask sizes up to a maximum of 7 inches.
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UV (Ultraviolet) Ozone Cleaning Device | UV-208/UV-312
Adoption of a low-pressure mercury lamp with a high-density grid shape as the UV light source.
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