Cleaning equipment related
Cleaning equipment related
Introduction of a product lineup centered around cleaning equipment used in the front-end of the semiconductor manufacturing process ◆ FOUP cleaning equipment ◆ SMIF & cassette cleaning equipment ◆ Vertical compact type photomask cleaning equipment ◆ Photomask cleaning equipment for PDP and large-format photomasks ◆ New type mask cleaning equipment TWC-300 ◆ Ultraviolet ozone cleaning equipment ◆ Super clean heater
1～7 item / All 7 items
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Cleaning Device | Wafer Cassette and Carrier Cleaning Device "TCC-803"
A cleaning device designed for the precision cleaning of wafer cassettes, carriers, boxes, and other items used in the manufacturing process of high-end, high-value-added products.
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Photo Mask Cleaning Device | Vertical Compact Type TWE-200
A mask cleaner that performs scrubbing, rinsing, and drying all in one machine to clean dust and dirt attached to photomasks.
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Photo Mask Cleaning Device | Simple Type Mask Cleaning Device TWC-302
"Scrub washing + rinse" & "Hot pure water drying" two-tank simple mask cleaning device
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Photo Mask Cleaning Device | For PDP and Large Photo Masks TW-1000
From small size to large size, scrubbing, rinsing, and drying are all performed with one machine!
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Mask Cleaning Machine | Fully Automatic Mask Cleaning Device "TWC-200A"
Complete removal of particles larger than 1μm and resist residue attached to the mask all at once.
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Simple Mask Cleaning Device | Simple Cleaning Unit
The simple cleaning unit is a basic cleaning unit that can accommodate mask sizes up to a maximum of 7 inches.
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UV (Ultraviolet) Ozone Cleaning Device | UV-208/UV-312
Adoption of a low-pressure mercury lamp with a high-density grid shape as the UV light source.
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