Mask Cleaning Machine | Fully Automatic Mask Cleaning Device "TWC-200A"
Complete removal of particles larger than 1μm and resist residue attached to the mask all at once.
The TWC-200A has been specifically developed for the cleaning of masks used in the exposure process. The main feature of this device is its ability to simultaneously and fully automatically remove both resist and particles adhered to the mask. In particular, for resist removal, a dedicated cleaning agent was developed in collaboration with a major chemical manufacturer, significantly improving the removal effectiveness while also considering safety and the global environment. The operator simply needs to place a cassette loaded with the mask. This enhances safety by eliminating exposure to hazardous chemicals and greatly contributes to improving the quality of the exposure process and yield.
basic information
■Main Features - Annual reduction of mask costs by around 100,000,000 yen* - Easy removal of resist adhered to the mask - Easy removal of particles adhered to the mask - Masks transition from disposable to permanent use - Developed a mild, water-soluble cleaning solution that is environmentally friendly - Freedom from hazards such as hot sulfuric acid and hydrogen peroxide - No need for expensive removers or developing solutions
Price range
Delivery Time
Model number/Brand name
TWC-200A
Applications/Examples of results
■Design rule L/S (Line and Space) optimal for cleaning photomasks with a size of 1μm or more FPD (Flat Panel Display), MEMS devices, fine pattern PCB/FPC/TAB, compound semiconductors, thin-film electronic components, etc.
