We will exhibit at SEMICON WEST.

ティックコーポレーション本社

Sonosys, a company known for its ultrasonic cleaning devices and ultrasonic cleaning spray nozzles, will be exhibiting at SEMICON WEST in San Francisco. They plan to showcase their latest ultrasonic cleaning devices and ultrasonic cleaning spray nozzles. Due to the recent semiconductor boom, ultrasonic cleaning devices are being used not only for wafer cleaning but also for cleaning MEMS and optical lenses, among other applications. It is reported that the president of Sonosys will also be present at the booth. Please take this opportunity to visit.

Date and time Tuesday, Jul 09, 2024 ～ Thursday, Jul 11, 2024
Capital USA / San Francisco / Moscone Center #1146 (South Hall)
Entry fee Free

Related product information

Ultrasonic Megasonic Cleaning Device (Single Sheet Cleaning / Bath Tank Type Cleaning)
Leave the latest ultrasonic cleaning to Sonosys.

Please refer to each product leaflet.
Sonosys Ultrasonic Spray Nozzle
A collaborative product of Rehila's nozzle technology and Sonosys's ultrasonic technology.

Typically, when creating fine particles, pressurization is necessary. Alternatively, a method using two fluids, known as a two-fluid system, is commonly used to break down liquids. However, if the particles have too much velocity, the liquid may scatter, creating a poor environment. To improve this, ultrasonic spray nozzles are often used. Features: - Can supply liquid without pressurization, resulting in low power consumption (lower energy costs) - Uniform atomization regardless of flow rate from minimum flow - Particle size remains relatively consistent across the entire flow range - Resistant to clogging, enhancing workplace safety - Due to the slow self-velocity of the particles, coating efficiency is high - Operating frequency ranges from 45 to 100 kHz (varies by model) - Average particle diameter is approximately 20 μm to 40 μm (note: not a volume average)