Electrostatic chuck for semiconductor manufacturing equipment
This is an electrostatic chuck for semiconductor manufacturing equipment. It can operate in atmospheric to high vacuum conditions and at temperatures ranging from -100 to 200°C. It can adsorb conductive to insulating substrates.
This is an electrostatic chuck designed for operation within semiconductor manufacturing equipment. It can operate in atmospheric to high vacuum conditions and at extremely low to high temperatures ranging from -100 to 200°C. Additionally, it can adsorb a wide range of materials from conductors to insulators. - It is capable of adsorbing substrates for Si compound semiconductors, sapphire, quartz, and LT LN semiconductors, from conductors to insulators. - Since it is adhesive-free, it can operate even in extremely low temperature regions of -100°C. - Our unique technology allows the holding force to act only at the contact interface between the workpiece and the electrostatic chuck, thus it is not affected by any influences from the backside (no effects from backside charging, etc.).
basic information
[Specifications] Target objects: Conductor ~ Insulator (Si compounds, sapphire, quartz, LT, LN substrates, etc.) Operating environment: Atmosphere ~ Vacuum, -100℃ to 200℃ Max, no condensation Control: Dedicated power supply Vertical holding force ±1kV: 130gf/cm² (Conductor ~ Semiconductor), 40gf/cm² (Insulator LCD Glass) Flatness: 10µm~ (consultation required)
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Applications/Examples of results
Ion implantation equipment Film deposition equipment Etching equipment Inspection and analysis equipment Exposure equipment Other: wafer transport, fixed stage
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Tsukuba Seiko Co., Ltd. is a company primarily engaged in the development, manufacturing, and sales of electrostatic adsorption systems. Our electrostatic chucks are designed to assist you in improving yield and production efficiency for your technological innovations. We can accommodate your specifications from prototypes to mass production, so please feel free to contact us.