Cleaning device WET CLEANER
Cleaning device WET CLEANER
We will propose solutions tailored to your operational needs and budget, combining high-pressure intermittent spray, two-fluid systems, brushes, ultrasonic cleaning, and chemical solutions for various materials including wafers, glass, and other materials. This includes everything from rough cleaning after polishing to precision cleaning, as well as the design and manufacturing of various cleaning devices, ranging from compact units for research and development to offline and inline mass production equipment. Please feel free to consult us about the cleaning process as well.
1～30 item / All 39 items
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Single Chamber Type "Wafer Multi-Purpose Spin Scrub Cleaning Device"
A space-saving cleaning device that removes foreign substances and metal contamination in a single chamber! It accommodates applications from mass production to research and development through a combination of cleaning methods.
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Space-saving type "Spin Cleaning Device (Multipurpose Cleaning Type)"
One-chamber multipurpose scrub cleaning. It is possible to remove foreign substances and metal contamination in one chamber! Space-saving, making it suitable for research and development.
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Wafer cleaning device "Double-sided brush cleaning device (mass production type)"
It is possible to transport, wash, and dry without touching the front and back surfaces of the work.
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Wafer cleaning device "Double-sided scrub cleaning device (for research and development)"
It is possible to transport, wash, and dry without touching the front and back surfaces of the workpiece.
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Wafer cleaning device "Double-sided brush cleaning device (for research and development)"
It is possible to transport, wash, and dry without touching the front and back surfaces of the work.
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Dual-side simultaneous scrub cleaning device for small diameter wafers (LT, SiC, etc. 2 to 6 inches)
A scrub cleaning device that allows for transportation and drying without touching the front and back of the workpiece! In addition to simultaneous cleaning of the front, back, and sides with a unique mechanism, it also supports combinations with ultrasonic showers and more.
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LT・SiC and other 2 to 6-inch small diameter wafer simultaneous chemical scrub cleaning device
A chemical cleaning device that enables the removal of contaminants, metal pollution, and transport and drying without touching the front and back surfaces of the workpiece! It also supports a combination with brush cleaning using chemicals.
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Cassette box cleaning device
Cleaning difficult-to-clean uneven surfaces with high-pressure pulse jets! More stable cleaning results can be achieved compared to manual cleaning.
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Box cleaning device
Cleaning difficult-to-wash uneven surfaces with high-pressure pulse jets! More stable cleaning results can be achieved compared to manual cleaning.
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FOSB cleaning device
Cleaning difficult-to-clean uneven surfaces with high-pressure pulse jets! More stable cleaning results can be achieved compared to manual cleaning.
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FOUP cleaning device
Cleaning difficult-to-wash uneven surfaces with high-pressure pulse jets! More stable cleaning results can be achieved compared to manual cleaning.
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Si Nugget Cleaning Device
Si Nugget cleaning device with automatic transport using a dedicated basket, from chemical polishing, acid cutting, high-quality water washing to drying, improving cleaning efficiency through basket oscillation.
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Precision parts cleaning device (degreasing)
Degreasing cleaning device for HDD motor parts (HUB, case, etc.) Example configuration: detergent + ultrasonic (degreasing cleaning) → pure water rinse + ultrasonic → warm air drying → vacuum drying
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Aerial Transport Cleaning Device 'DACC-061-3L'
Next-generation cleaning device that allows for roller-driven end face and size adjustment in the river width direction.
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BOX cleaning device 'DBC-1700'
Continuous processing of warm water washing, rinsing, and draining in the same tank! Containers of all shapes and sizes can be cleaned.
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Various manufacturing equipment
A wide range of products including semiconductor manufacturing equipment, cleaning devices for LED and OLED, and air purification devices.
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Non-contact transport cleaning device 'DNCC-320'
It is also possible to transport thin lightweight substrates under 0.5t! A next-generation cleaning device that can clean fingerprints from skin oils, glass cullet, and oil-based markers.
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High-pressure pulse jet cleaning machine "DPC-700"
Cleaning effectiveness achievable because we are a semiconductor cleaning equipment manufacturer! Challenging new fields with proven submicron particle removal performance.
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Organic solvent cleaning equipment
The system consists of the main unit, pump unit, and control panel! The chemical supply method is the CCSS method for organic solvent cleaning equipment.
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Precision parts cleaning device
Introduction to a precision parts cleaning device that can be customized for various applications using a dedicated basket for dip processing!
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Vacuum drying device
The work placement table inside the drying oven is specially designed! The front door opens to one side, providing a wide opening that makes it easy to load and unload parts.
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Magnetic head cleaning device
The rinse drying process is a composite rinse drying treatment that incorporates pure water dip, QDR, pure water shower, and spin dryer into one chamber!
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Yutaka Drying Device
No watermark generation! A device that dries using the principle of surface tension with slow lifting.
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Mask glass cleaning device
The passline is 400mm! It will be cleaned with SPM and neutral detergent + US, and dried with warm water extraction.
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Si Nugget Cleaning Device
Using hydrofluoric acid and nitric acid! The cleaning basket is agitated to improve cleaning efficiency!
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Cassette cleaning device for PDP
Designed and manufactured to match the cassette! An automatic cleaning device that performs pure water high-pressure washing and warm air drying.
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Processing equipment for OLEDs
Processing speed is 0.6 to 5.0 m/min (variable)! We provide cleaning equipment for organic EL manufacturing lines.
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IR Drying Oven
The processing speed is 75mm/s! The glass substrate is heated and dried with a clean far-infrared heater.
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300mm wafer cassette-less cleaning system
Achieved 65nμm / 5 pieces of high purity! Inserted 25 pieces into the gaps of 25 Wf, halving the pitch and processing 50 pieces at once.
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LT・SiC and other 2 to 6-inch small diameter wafer simultaneous chemical scrub cleaning device.
A chemical cleaning device that enables transportation and drying without touching the front and back of the workpiece, as well as the removal of foreign substances and metal contamination! It also supports a combination with brush cleaning using the chemical solution.
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