Cleaning device WET CLEANER
Cleaning device WET CLEANER
We will propose solutions tailored to your operational needs and budget, combining high-pressure intermittent spray, two-fluid systems, brushes, ultrasonic cleaning, and chemical solutions for various materials including wafers, glass, and other materials. This includes everything from rough cleaning after polishing to precision cleaning, as well as the design and manufacturing of various cleaning devices, ranging from compact units for research and development to offline and inline mass production equipment. Please feel free to consult us about the cleaning process as well.
31～39 item / All 39 items
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Cassette box cleaning device
Cleaning difficult-to-clean uneven surfaces with high-pressure pulse jets! More stable cleaning results can be achieved compared to manual cleaning.
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Box cleaning device
Cleaning difficult-to-clean uneven surfaces with high-pressure pulse jets! More stable cleaning results can be achieved compared to manual cleaning.
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FOSB cleaning device
Cleaning difficult-to-clean uneven surfaces with high-pressure pulse jets! More stable cleaning results can be achieved compared to manual cleaning.
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FOUP cleaning device
Cleaning difficult-to-clean uneven surfaces with high-pressure pulse jets! More stable cleaning results can be achieved compared to manual cleaning.
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Dual-side simultaneous scrub cleaning device for small diameter wafers (LT, SiC, etc. 2 to 6 inches)
A scrub cleaning device that allows for transportation and drying without touching the front and back of the workpiece! In addition to simultaneous cleaning of the front, back, and sides with a unique mechanism, it also supports combinations with ultrasonic showers and more.
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Space-saving type "Spin Cleaning Device (Multipurpose Cleaning Type)"
One-chamber multi-purpose scrub cleaning. It is possible to remove foreign substances and metal contamination in one chamber! Space-saving, making it suitable for research and development.
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Wafer cleaning device "Double-sided brush cleaning device (for research and development)"
It is possible to transport, wash, and dry without touching the front and back surfaces of the work.
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Wafer cleaning device "Double-sided scrub cleaning device (for research and development)"
It is possible to transport, wash, and dry without touching the front and back surfaces of the work.
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Wafer cleaning device "Double-sided brush cleaning device (mass production type)"
It is possible to transport, wash, and dry without touching the front and back surfaces of the work.
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