ゼビオス（XEVIOS CORP.,） Official site

Contact Us

Wafer cleaning device "Double-sided brush cleaning device (for research and development)"

cleaner.png

Wafer cleaning device "Double-sided brush cleaning device (for research and development)"

cleaner.png
cleaner.png

It is possible to transport, wash, and dry without touching the front and back surfaces of the work.

A single-wafer device that performs polishing slurry cleaning with surfactants and pure water, rinsing with a megasonic spot shower, and spin drying. It allows for transport, cleaning, and drying without touching the front and back surfaces of the workpiece. Simultaneous edge scrubbing is also performed. ■ Capable of simultaneous cleaning of both sides ■ Target wafers for cleaning: silicon, quartz, oxides, compounds, etc. ■ Compatible wafer diameters: φ2” to φ8”; thickness is negotiable ■ Also compatible with transparent wafers *For more details, please contact us or download the catalog for review.

Related Link - https://xevios.com/

basic information

For more details, please contact us or download the catalog to view it.

Price range

Delivery Time

Applications/Examples of results

【Purpose】 Various wafer cleaning

catalog（1）

Download All Catalogs

Dual-sided scrub cleaning device (mass production compatible device)

PRODUCT

Contact this catalog

Recommended products

  • Polishing device POLISHER

Wafer edge mirror polishing device (Edge Polish)

ゼビオス（XEVIOS CORP.,）

  • Cleaning device WET CLEANER

Precision parts cleaning device (degreasing)

ゼビオス（XEVIOS CORP.,）

  • Cleaning device WET CLEANER

Si Nugget Cleaning Device

ゼビオス（XEVIOS CORP.,）

  • Cleaning device WET CLEANER

FOUP cleaning device

ゼビオス（XEVIOS CORP.,）

  • Cleaning device WET CLEANER

FOSB cleaning device

ゼビオス（XEVIOS CORP.,）

  • Cleaning device WET CLEANER

Box cleaning device

ゼビオス（XEVIOS CORP.,）

  • Cleaning device WET CLEANER

Cassette box cleaning device

ゼビオス（XEVIOS CORP.,）

  • High Pressure Pulse Jet DP-GUN

High-pressure intermittent spray "DP-Gun"

ゼビオス（XEVIOS CORP.,）

  • High Pressure Pulse Jet DP-GUN

High-pressure pulse jet DP-Gun for cleaning masks, glass, and wafers.

ゼビオス（XEVIOS CORP.,）

  • Dispersion Device SPACER SPRAYER

Dry Dispersion Device "Particle-Compatible Dispersion and Spreading Device"

ゼビオス（XEVIOS CORP.,）

  • Dispersion Device SPACER SPRAYER

Dry Spreading Device "Desktop Type Simple Spreader"

ゼビオス（XEVIOS CORP.,）

  • Dispersion Device SPACER SPRAYER

Dry Spreader Device "Dry Spacer Spreading Device"

ゼビオス（XEVIOS CORP.,）

  • Cleaning device WET CLEANER

Single Chamber Type "Wafer Multi-Purpose Spin Scrub Cleaning Device"

ゼビオス（XEVIOS CORP.,）

  • Cleaning device WET CLEANER

LT・SiC and other 2 to 6-inch small diameter wafer simultaneous chemical scrub cleaning device

ゼビオス（XEVIOS CORP.,）

  • Cleaning device WET CLEANER

Dual-side simultaneous scrub cleaning device for small diameter wafers (LT, SiC, etc. 2 to 6 inches)

ゼビオス（XEVIOS CORP.,）

  • Cleaning device WET CLEANER

Wafer cleaning device "Double-sided brush cleaning device (for research and development)"

ゼビオス（XEVIOS CORP.,）

  • Cleaning device WET CLEANER

Wafer cleaning device "Double-sided scrub cleaning device (for research and development)"

ゼビオス（XEVIOS CORP.,）

  • Cleaning device WET CLEANER

Wafer cleaning device "Double-sided brush cleaning device (mass production type)"

ゼビオス（XEVIOS CORP.,）

  • Cleaning device WET CLEANER

Space-saving type "Spin Cleaning Device (Multipurpose Cleaning Type)"

ゼビオス（XEVIOS CORP.,）

Distributors