洗浄装置 WET CLEANER
洗浄装置 WET CLEANER
ウェハ・ガラス・各種材料に対して、高圧断続スプレー・ニ流体・ブラシ・ 超音波・薬液等を組合せ、 研磨後の粗洗浄から精密洗浄、各種洗浄装置の設計から製造、研究開発用のコンパクトな1台 からオフライン・インラインの量産装置まで、運用目的とご予算に合わてご提案致します。洗浄プロセスについてもご相談下さい。
1～13 件を表示 ／ 全 13 件
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Single Chamber Type "Wafer Multi-Purpose Spin Scrub Cleaning Device"
A space-saving cleaning device that removes foreign substances and metal contamination in a single chamber! It accommodates applications from mass production to research and development through a combination of cleaning methods.
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Space-saving type "Spin Cleaning Device (Multipurpose Cleaning Type)"
One-chamber multipurpose scrub cleaning. It is possible to remove foreign substances and metal contamination in one chamber! Space-saving, making it suitable for research and development.
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Wafer cleaning device "Double-sided brush cleaning device (mass production type)"
It is possible to transport, wash, and dry without touching the front and back surfaces of the work.
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Wafer cleaning device "Double-sided scrub cleaning device (for research and development)"
It is possible to transport, wash, and dry without touching the front and back surfaces of the workpiece.
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Wafer cleaning device "Double-sided brush cleaning device (for research and development)"
It is possible to transport, wash, and dry without touching the front and back surfaces of the work.
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Dual-side simultaneous scrub cleaning device for small diameter wafers (LT, SiC, etc. 2 to 6 inches)
A scrub cleaning device that allows for transportation and drying without touching the front and back of the workpiece! In addition to simultaneous cleaning of the front, back, and sides with a unique mechanism, it also supports combinations with ultrasonic showers and more.
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LT・SiC and other 2 to 6-inch small diameter wafer simultaneous chemical scrub cleaning device
A chemical cleaning device that enables the removal of contaminants, metal pollution, and transport and drying without touching the front and back surfaces of the workpiece! It also supports a combination with brush cleaning using chemicals.
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Cassette box cleaning device
Cleaning difficult-to-clean uneven surfaces with high-pressure pulse jets! More stable cleaning results can be achieved compared to manual cleaning.
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Box cleaning device
Cleaning difficult-to-wash uneven surfaces with high-pressure pulse jets! More stable cleaning results can be achieved compared to manual cleaning.
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FOSB cleaning device
Cleaning difficult-to-clean uneven surfaces with high-pressure pulse jets! More stable cleaning results can be achieved compared to manual cleaning.
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FOUP cleaning device
Cleaning difficult-to-wash uneven surfaces with high-pressure pulse jets! More stable cleaning results can be achieved compared to manual cleaning.
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Si Nugget Cleaning Device
Si Nugget cleaning device with automatic transport using a dedicated basket, from chemical polishing, acid cutting, high-quality water washing to drying, improving cleaning efficiency through basket oscillation.
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Precision parts cleaning device (degreasing)
Degreasing cleaning device for HDD motor parts (HUB, case, etc.) Example configuration: detergent + ultrasonic (degreasing cleaning) → pure water rinse + ultrasonic → warm air drying → vacuum drying
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