Single Chamber Type "Wafer Multi-Purpose Spin Scrub Cleaning Device"
A space-saving cleaning device that removes foreign substances and metal contamination in a single chamber! It accommodates applications from mass production to research and development through a combination of cleaning methods.
A single-wafer device that performs the processes of surfactant and pure water scrub cleaning, chemical spraying, megasonic spot shower, and spin drying all in one chamber. ◇ Space-saving design that completes the process in a single chamber ◇ Compatible with various wafers including Si (silicon), LT (lithium tantalate), and SiC (silicon carbide) ◇ Removal of foreign substances (organic and inorganic) and metal ions ◇ Flexible response to changes in cleaning items and device configuration *For more details, please contact us or download the catalog to view.
basic information
< Cleaning Process > - Surfactant and pure scrub cleaning - Chemical liquid spray - Megasonic spot shower - Spin drying < Cleaning Targets > Various wafers - Si (Silicon) - Quartz - Oxides - Compounds, etc. < Compatible Wafer Diameters > - φ2” to φ4” - φ6” to φ8” < Others > We can accommodate single-function scrub cleaning devices, use of chemical liquids, types with dry/wet loaders and unloaders, and multiple chamber types according to your budget and requirements. Please feel free to consult us regarding cleaning methods.
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Applications/Examples of results
【Usage】 ■Various wafer cleaning
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This brand name was chosen to signify the creation of highly unique products with the aim of "EXTENSIVE VISION ON SYSTEM." Current technological innovations are remarkable, and the demands of the times are constantly becoming more advanced. We believe that it is our mission at Zebios to contribute to the industry by consistently proposing differentiated equipment that will revolutionize the now-mature equipment industry.