Flat-type infrared heating furnace IR-FP Series
Infrared concentrated heating enables high-speed, high-temperature, and uniform heating. We will manufacture according to the customer's needs.
The "IR-FP Series" is a flat-type infrared heating furnace capable of heating up to 1100°C. It allows for output adjustment for each zone, enabling heating in various temperature environments. Clean heating is possible, along with vacuum compatibility, gas flow, and observation. It is ideal for heating silicon wafers, compound semiconductors, and thin steel plate processing. It can be used for applications involving heat resistance, deformation, and observation of resins, films, and adhesives. The furnace size can be adjusted according to the sample size. For more details, please contact us or refer to the catalog.
basic information
【Basic Configuration】 ○ Heating furnace body ○ Sample holder (quartz holder, one set of thermocouples) ○ Temperature controller 【Options】 ○ Vacuum compatibility inside the furnace ○ Gas cooling mechanism ○ Vacuum exhaust system ○ Heating plate ○ Cooling water circulation device ○ CCD camera and observation system 【Main Specifications】 ○ Temperature range: RT~1100℃ ○ Heating characteristics: 30℃/second ○ Heating method: Infrared reflective concentrated heating ○ Cooling method: Natural cooling ○ Atmosphere: Ambient, over-purge (vacuum and gas flow possible with options) ○ Heating area: Approximately 100×100mm to 100×200mm, 3 inches to 6 inches ○ Temperature sensor: K or R thermocouple ○ Temperature control: Digital program PID-SCR control ○ Temperature program: 99 programs, 99 segments ○ Safety measures: Water cooling for the furnace body, with safety features *Varies depending on the thermal capacity of the heating target. ● For more details, please contact us or refer to the catalog.
Price information
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Delivery Time
Applications/Examples of results
For more details, please contact us or refer to the catalog.
