All products and services
1～30 item / All 37 items
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Responding with flexibility and quick action! "Contract Manufacturing of Chemical Products"
We support the manufacturing of high-quality chemical products with flexible and speedy responses. Utilizing our extensive experience and advanced equipment, we propose the optimal manufacturing and supply methods!
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InP roughening etching solution
The surface of the InP film can be effectively roughened through etching, which can improve the light extraction efficiency.
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Contracted Services <Image Observation/Chemical Treatment> *Such as semiconductor substrates and LCD substrates
High-resolution SEM images available! Contract services for image observation of semiconductor substrates, LCD substrates, electronic device substrates, and more.
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Reagent preparation service <Case study presentation>
From small quantities to large volumes. Providing suitable products with our unique blending technology. Eliminating the burden of reagent preparation and contributing to business improvement.
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Contract manufacturing services for chemical materials used in electronics.
Leveraging abundant experience and technical expertise to provide high-quality chemical products. Equipped with a variety of analytical instruments, we also ensure thorough quality control.
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[Project Story] Introduction of Case Studies
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Low metal (UHP) grade chemical PGMEA
We have commercialized a low metal grade (UHP grade) of PGMEA. We propose it as a grade that can be used in fields where ultra-low metal content is required.
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Ni rough surface etching solution "Pure Etch MF series"
The surface of Ni is well roughened and etched without using any special techniques.
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Cu seed layer etching solution
For the Cu plating/Cu seed structure, it etches the Cu seed layer with minimal damage to the Cu plating wiring and bumps.
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Roughening etching solution
Reduction of reflectivity, improvement of efficiency, enhancement of adhesion, roughening of silicon, compound semiconductors, and metal surfaces.
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SUS Roughening Etching Solution "PureEtch MF series"
The surface of SUS material is effectively roughened by etching without using any special techniques.
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Si etching solution (isotropic)
We perform good isotropic etching of the Si film. In addition to standard isotropic etching solutions, we also have thinning etching solutions that are optimal for thinning Si substrates.
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Crystal etching liquid "Pure Etch ZE series"
We etch the quartz with a flatter bottom shape than conventional products without corroding the mask made of resist or metal films (such as Au and Cr).
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PZT etching solution "Pure Etch PT series"
We will etch the PZT (lead zirconate titanate) film well.
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TiW Etching Solution "Pure Etch TE Series"
We etch TiW films effectively. Since the etching performance varies depending on the film formation method and film structure, please contact us for more details.
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Single crystal silicon texture etching solution
We will form a texture on the single crystal silicon substrate (possible size: 2 to 3 μm).
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Ni Etching Solution "Pure Etch NE series"
It etches the Ni film well.
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Color filter rework stripping solution, polyimide stripping solution
It is a chemical agent optimal for rework delamination after BM, RGB, OC formation, or polyimide delamination.
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Release agent remover (water-based) "PureClean MC series"
The release of the resist is good. The water-based release agent does not fall under hazardous materials according to fire safety regulations.
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Au Etching Solution "Pure Etch AU series"
We will etch the Au film well. There are also etching solutions for seed layers that cause little damage to the Au plating and allow for etching of the Au seed layer.
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Resist stripping solution (amine/solvent-based, solvent-based, organic alkaline-based)
We have a range of stripping solutions, including those mixed with amines and solvents, solvent-based stripping solutions, and organic alkaline stripping solutions.
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ITO etching solution "Clean Etch ITO series"
We provide excellent etching for ITO films, with options available for both a-ITO etching and p-ITO etching.
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Cr Etching Solution "Pure Etch CR series"
We will etch the Cr film well. If you are considering the formation of fine patterns, we also offer suggestions for pretreatment solutions to improve wettability.
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W Etching Solution 'Pure Etch W Series'
We will etch the W film well.
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Ti etching solution standard, Ti seed layer etching solution
We will etch the Ti film effectively. We have options for standard thin film etching and Ti seed layer etching.
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Cu etching solution "Pure Etch C series"
We etch Cu and Cu alloy films effectively. We offer solutions for standard thin film etching and bulk etching of Cu/Ti stacked films.
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Ag・Ag alloy・Ag-based laminated film etching solution
This etching solution is ideal for etching single-layer films of silver alloys such as Ag single films, APC (Ag-Pd-Cu alloy) films, or laminated films of Ag/transparent conductive films.
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Standard sample for Al・Mo・Mo/Al/Mo multilayer film
It etches single films of Al, Al alloys, or Mo, Mo alloys, as well as layered films such as Mo/Al/Mo and Mo alloy/Al alloy/Mo alloy effectively.
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[Comprehensive Catalog] High-performance pharmaceuticals packed with 110 years of history and technology.
A comprehensive catalog of high-performance chemicals essential for the manufacturing of electrical and electronic devices, filled with 110 years of experience, technology, and know-how.
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Ag nanowire etching solution
We provide excellent etching of Ag nanowire films, available for both full etching and partial etching.
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