Spin dryer (dryer)
Demo units available for loan! Ideal for spin drying silicon wafers, masks, and film substrates!
~Overview~ - By incorporating an ULPA or HEPA filter into the lid, the cleanliness within the chamber is significantly improved by introducing clean air. - The replacement of the cradle allows for the drying of 4 to 8-inch wafers. For 12-inch wafers, it accommodates up to 2 carriers. - In the event of abnormal vibrations, it automatically stops.
basic information
~Overview~ - By incorporating ULPA or HEPA filters into the lid and introducing clean air, the cleanliness within the chamber is dramatically improved. - By replacing the cradle, drying of 4 to 8-inch wafers is possible. For 12-inch wafers, it can accommodate up to 2 carriers. - In the event of abnormal vibrations, it automatically stops. - Special seals prevent the generation of particles from the rotating shaft. - We also manufacture spin dryers for special specifications, including glass substrates and ceramic substrate systems.
Price information
-
Delivery Time
Model number/Brand name
Spin dryer (dryer)
Applications/Examples of results
1. Semiconductor industry: Spin drying of silicon wafers and masks 2. LCD industry: Spin drying of glass 3. Substrate industry: Spin drying of ceramic substrates, epoxy substrates, glass, and film substrates 4. Hard disk: Spin drying after cleaning 5. Lens: Spin drying after cleaning the lens
