Sputtering device

Sputtering device
We would like to introduce the "sputtering equipment" that we handle.
1~9 item / All 9 items
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Custom Manufacturing Achievements: Sputtering Equipment
We have achievements such as 'sputtering equipment with GB for organic EL' and 'IBS equipment for research and development'!
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Load-lock type sputtering device
We can also accommodate combinations of CVD chambers, deposition chambers, plasma cleaning chambers, etc.!
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Multi-target sputtering device
Achieving a substrate temperature of 900℃! Equipped with a 3-axis mechanism on the substrate stage to realize a uniform film thickness distribution.
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Sputtering device for three-dimensional objects
Achieve high coverage in three-dimensional object film formation! Equipped with up to three sputter cathodes, it enables the layered deposition of metal films, oxide films, and more!
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【Thorough Developer Perspective】Custom manufacturing of various devices available.
Consultations are welcome! We handle everything in-house from design to manufacturing and assembly! If you are having trouble with various equipment manufacturing, please feel free to consult with us. *Case study materials are currently available.
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High-Rate Deposition. Piezoelectric Film Formation Sputtering Device
For semiconductors, MEMS, electronic components, etc.! High-speed and stable continuous film deposition is possible from single crystal epitaxial buffer layers to piezoelectric films!
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High-Rate Depo. Piezoelectric Film Formation Sputtering Device
For semiconductors, MEMS, electronic components, etc.! High-speed and stable continuous film deposition is possible from single crystal epitaxial buffer layers to piezoelectric films!
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Screw stirring type powder sputtering device
Space-saving and large capacity! Custom-made options are also available to meet various requests!
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Barrel/drum-type powder sputtering device
Powder agglomeration measures are possible! Custom-made solutions tailored to various requests can also be produced!
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