Custom Manufacturing Achievements: Sputtering Equipment

We have achievements such as 'sputtering equipment with GB for organic EL' and 'IBS equipment for research and development'!

last updated Jul 02, 2025

Load-lock type sputtering device

We can also accommodate combinations of CVD chambers, deposition chambers, plasma cleaning chambers, etc.!

last updated Jul 02, 2025

Multi-target sputtering device

Achieving a substrate temperature of 900℃! Equipped with a 3-axis mechanism on the substrate stage to realize a uniform film thickness distribution.

last updated Jul 02, 2025

Sputtering device for three-dimensional objects

Achieve high coverage in three-dimensional object film formation! Equipped with up to three sputter cathodes, it enables the layered deposition of metal films, oxide films, and more!

last updated Jul 02, 2025

【Thorough Developer Perspective】Custom manufacturing of various devices available.

Consultations are welcome! We handle everything in-house from design to manufacturing and assembly! If you are having trouble with various equipment manufacturing, please feel free to consult with us. *Case study materials are currently available.

last updated Jul 02, 2025

High-Rate Depo. Piezoelectric Film Formation Sputtering Device

For semiconductors, MEMS, electronic components, etc.! High-speed and stable continuous film deposition is possible from single crystal epitaxial buffer layers to piezoelectric films!

last updated Jul 02, 2025

High-Rate Deposition. Piezoelectric Film Formation Sputtering Device

For semiconductors, MEMS, electronic components, etc.! High-speed and stable continuous film deposition is possible from single crystal epitaxial buffer layers to piezoelectric films!

last updated Jul 02, 2025

Screw stirring type powder sputtering device

Space-saving and large capacity! Custom-made options are also available to meet various requests!

last updated Jul 02, 2025