Spin Cleaning Device Automatic Photoresist Device Model JASC-1200AD
The target work is applicable to a 200mm square substrate or a φ300mm substrate!
The automatic photoresist coating device automatically performs resist spin coating, vacuum baking, alignment, and spray development from cassette to cassette. Of course, you can also select the processes. The loader and unloader can be operated by one operator from the same side. A multi-joint robot is used for transportation between processes. This machine is suitable for 200mm square substrates or φ300mm substrates. For more details, please contact us or refer to the catalog.
basic information
【Features】 ○ A device that automatically performs resist spin coating, vacuum baking, alignment, and spray development from cassette to cassette → Selection of processes is also possible ○ Loader and unloader are on the same side → Work can be done by one operator ○ Multi-joint robots are used for transportation between processes ○ Target work: Applicable to 200mm square substrates or φ300mm substrates 【Specifications】 ○ Dimensions W2300×D2300×H1850 ○ Loader: Stores 1 cassette ○ Cup: SUS304 Teflon-coated ○ Dispenser: Pneumatic diaphragm type ○ Supply tank: For resist bottles ○ Automatic cup cleaning: Acetone, bellows pump ○ Gas-liquid separation tank: SUS304 ○ Exposure machine: Optional ○ Development cup: SUS304 Teflon-coated ○ Baking furnace: Hot plate, vacuum chamber ○ Rotation speed: MAX 3000rpm ○ Motor: 400W AC servo motor ○ Transport device: Multi-joint robot ○ Hanger: Edge clamp type ○ Baking: Three-stage hot plate, transport shuttle method ○ Unloader: Stores 1 cassette ● For more details, please contact us or refer to the catalog.
Price information
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Applications/Examples of results
For more details, please contact us or refer to the catalog.
