Spin Cleaning Device Spray Development Device SD-8004 Type
Automatic and manual operation will perform developing, rinsing, washing, and spin drying!
The SD-8004 model is a spin spray development system for 4" to 8" wafers. It performs developing, rinsing, water washing, and spin drying through automatic and manual operation. Condition settings are done via a touch panel on the operation panel. Each processing mode is displayed on the touch panel during the respective mode. For more details, please contact us or refer to the catalog.
basic information
【Features】 ○ Spin-type spray developing equipment for 4" to 8" wafers ○ Performs developing, rinsing, water washing, and spin drying through automatic and manual operation ○ Condition settings are executed via a touch panel on the operation panel ○ Each processing mode is displayed on the touch panel during operation 【Specifications】 ○ Dimensions: W1490×D1100×H1650 ○ Number of wafers processed: 2 to 8 wafers ○ Liquids used: Developer, rinse solution, pure water ○ Rotation speed: 0 to 1200 rpm ○ Rotating table: φ530 ○ Nozzle arms: 2, with 4 nozzles each ○ Rotation speed display: Digital display ○ Number of programs: 10 programs with 50 steps ○ Included tanks: Developer tank, stirring tank, rinse solution tank ○ Control panel: LCD touch panel ○ Exhaust: 7m³/min ● For more details, please contact us or refer to the catalog.
Price information
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