Single Wafer Processing Equipment "Automatic Resist Coating and Developing System"
Wafer resist coating device that uses high-performance pumps for high-precision coating.
The "Automatic Resist Coating and Developing System" is a sheet-type automatic resist coating and developing device. It is equipped with a resist coating chamber and a developing chamber. The resist coating uses a high-performance pump according to viscosity, allowing for high-precision coating. Additionally, the developing solution is constantly maintained at a constant temperature through an electronic cooler and circulated, enabling high-precision developing processing. The transportation of wafers is handled by a 3-axis multi-joint clean robot installed at the center of the device, which is also equipped with a loader and unloader. 【Features】 - Suitable for wafers from 2 inches to 18 inches and 300mm square substrates - Uses a multi-joint robot from the loader - Automatically processes through each stage to the unloader cassette For more details, please contact us or download the catalog.
basic information
【Process】 [Resist coater] ○Centering ○Loader ○HMDS ○Resist coater ○Bake ○Bake ○Bake ○Cool plate ○Unloader [Developing] ○Centering ○Loader ○Developing ○Rinse ○Bake ○Bake ○Bake ○Cool plate ○Unloader ●For more details, please contact us or download the catalog.
Price information
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Delivery Time
Applications/Examples of results
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