Single-wafer automatic cleaning device "RCA Wafer Cleaning System"
Customization is okay! We offer quick responses and after-sales support unique to manufacturers.
The "RCA Wafer Cleaning System" is an automatic cleaning device primarily based on the RCA cleaning method, widely adopted as a highly reliable cleaning method. With a "3-axis multi-joint clean robot" for wafer transport and "FOUP" used for loaders and unloaders, it achieves cleaning in a non-particle environment. 【Features】 ■ Quick response from estimates to customization ■ Support for our own equipment as well as other manufacturers' equipment ■ Detailed response to sudden specification changes *For more details, please download the catalog or contact us. 【Exhibition Information】 SEMICON Japan Location: Tokyo Big Sight Period: December 13-15, 2017 Booth Number: 3509, East Hall
basic information
【Lineup】 In addition to the "RCA Wafer Cleaning System," we have a wide range of products available. ■ Automatic Wafer Cleaning System ■ Automatic Etching System ■ Automatic Developer for Substrates ■ Automatic Wafer Resist Coater ■ Automatic Rectangular Substrate Resist Coater ■ Automatic Resist Coating and Developing System *For more details, please download the catalog or contact us.
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For more details, please refer to the catalog or feel free to contact us.
