Load lock type EB evaporation deposition device
Reduction of particles through suitable surface treatment! Compatible with high vacuum processes using a load-lock system.
The "Load Lock Type EB Evaporation Device" achieves excellent film thickness distribution and reproducibility through substrate rotation. It supports high vacuum processes using a load lock system, as well as lift-off processes and tray transport. It is capable of high-temperature processes up to 900°C, and maintenance of the chamber is easy. Please feel free to contact us when needed. 【Features】 ■ Capable of high-temperature processes up to 900°C ■ Achieves excellent film thickness distribution and reproducibility through substrate rotation ■ Supports high vacuum processes with a load lock system ■ Reduces particles through suitable surface treatment ■ Easy maintenance of the chamber *For more details, please refer to the PDF materials or feel free to contact us.
basic information
【Other Features】 - Supports lift-off processes - Supports tray transport - Multi-chamber specifications and batch types can also be manufactured - Various custom-made options are available - Sample processing conducted with demo equipment *For more details, please refer to the PDF document or feel free to contact us.
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Applications/Examples of results
【Applications】 ■LED elements ■Electronic components ■Optical components ■MEMS ■Power devices *For more details, please refer to the PDF document or feel free to contact us.
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Japan Create has been challenging cutting-edge technologies to respond to the diversification of the semiconductor industry with high precision, labor-saving, and miniaturization. We seek infinite possibilities in high technology and create reliable know-how that matches user needs with our uniqueness. We will continue to strive towards high-level technology.