Plasma CVD device for three-dimensional objects
A simple structure with high versatility! It adopts a unique plasma control method.
The "Plasma CVD Equipment for Three-Dimensional Objects" has a wealth of accumulated data and employs a unique plasma control method. The chamber volume is 1m3. It features a simple structure with high versatility, capable of multi-stage bulk processing. We can also manufacture multi-chamber specifications and various custom orders, so please feel free to contact us when needed. 【Features】 ■ Chamber volume: 1m3 ■ Unique plasma control method ■ Capable of multi-stage bulk processing ■ Simple structure with high versatility ■ Can deposit films on various product materials *For more details, please refer to the PDF document or feel free to contact us.
basic information
【Other Features】 ■ Extensive control over membrane characteristics ■ Abundant accumulated data ■ Multi-chamber specifications can also be manufactured ■ Various custom orders can also be produced ■ Sample processing conducted with demo equipment *For more details, please refer to the PDF document or feel free to contact us.
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Applications/Examples of results
【Applications】 ■ Various tools ■ Sliding parts ■ Decorative items ■ Automotive parts ■ Mechanical parts *For more details, please refer to the PDF document or feel free to contact us.
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Japan Create has been challenging cutting-edge technologies to respond to the diversification of the semiconductor industry with high precision, labor-saving, and miniaturization. We seek infinite possibilities in high technology and create reliable know-how that matches user needs with our uniqueness. We will continue to strive towards high-level technology.