Process Analysis Instrument Technical Documentation: Quality Control of Wafer Cleaning Tanks
Simultaneous analysis of ammonium hydroxide, hydrogen peroxide, and hydrochloric acid in the wafer cleaning tank monitored by inline near-infrared analyzer!
In semiconductor manufacturing, standard cleaning processes are conducted in wet benches within clean rooms, where the environment is controlled to prevent further contamination. However, it is common for space to be very limited for installing analytical instruments in such environments. To monitor the main parameters of cleaning solutions simultaneously, more safely, efficiently, and quickly without using reagents, inline analysis using near-infrared spectroscopy (NIRS) is effective. Online analyzers, process analyzers, inline analyzers.
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Inline near-infrared analyzer
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