[Kansai Manufacturing Selection 2023 Selected!] Precise & Smooth Film Formation Device
The 'Arc Discharge Magnetron Sputtering Device' that achieves an astonishingly precise and smooth reaction film.
We would like to introduce our "Arc Discharge Type Magnetron Sputtering Device." By adding a low-voltage, high-current arc discharge mechanism to the front of the magnetron sputtering mechanism, the amount of ions incident on the substrate has increased tenfold compared to conventional devices, allowing for the formation of dense, hard, and smooth reaction films at an industrial level. Additionally, the elimination of the need for finishing polishing on the coating surface has improved durability and contributed to energy savings. 【Features】 - Addition of a low-voltage, high-current arc discharge mechanism to the front of the magnetron sputtering mechanism - Ten times more ions incident on the substrate compared to conventional devices - Formation of dense, hard, and smooth reaction films at an industrial level - No need for finishing polishing on the coating surface - Improved durability and contribution to energy savings *For more details, please refer to the PDF document or feel free to contact us.
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