AlN template creation device (sputtering device for oriented AlN films)
AlN templates for UV-LEDs using sputtering. AlN films with high crystallinity and C-axis orientation can be created by sputtering. Latest model deposition equipment.
A AlN template on a sapphire substrate necessary for reducing the manufacturing cost of UV-LEDs is created by sputtering. An AlN film with a C-axis orientation of less than 100 arc/sec is formed by sputtering at low temperatures (below 700°C). This contributes to the cost reduction of UV-LEDs with a simple and stable process and high throughput. Sample testing is currently underway, and development for expansion into high-frequency devices is also in progress.
basic information
Significantly improved the film formation system (cathode, chamber, process) compared to standard type load lock sputtering equipment. Two types are available: a small cathode used in R&D type equipment and a large cathode for mass production.
Price information
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Delivery Time
Applications/Examples of results
UV-LED Research, Prototyping, Mass Production MEMS Research and Development
