Atmospheric non-exposure multi-sputtering device
Sulfur compound compatibility available. Dedicated film deposition device for research on thin-film solid-state batteries. Comprehensive support from target to film deposition testing, including dedicated equipment. Standard glove box included.
Dedicated sputtering equipment for research on thin-film solid-state secondary batteries. Post-processing is possible. It allows for the simultaneous formation of the anode, electrolyte, and cathode using a multi-component cathode, as well as sealing the substrate to prevent exposure to the atmosphere after film formation. Pre-film tests using a dedicated Li target are also available (for a fee). Comprehensive support for materials (targets), soft (film formation tests), and hard (dedicated equipment). Sulfide targets and dedicated glove boxes can also be equipped, achieving both versatility and individual customization.
basic information
Customized standard sputtering device equipped with a 3-inch cathode and three targets. Comes standard with a dedicated target and glove box. Targets such as Li-based composite oxides and sulfides are also supplied, with paid support for film deposition testing. Follows the basic specifications of a sputtering device with a wealth of research and development experience, capable of depositing films over large areas (φ180) using small-diameter targets. Standard features include a substrate heating heater and substrate water cooling mechanism, enabling a wide range of deposition conditions. Offers a variety of options such as ferromagnetic cathodes, simultaneous sputtering, and load-lock mechanisms to meet diverse requirements for hard materials.
Price information
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Delivery Time
Model number/Brand name
SRV3320 model
Applications/Examples of results
Research and development of thin-film solid secondary batteries Research and development of compound semiconductors Research and development of photosensitive materials and optical devices Film formation of low melting point materials
