Hydrogen-free DLC coating device (high-density sputtering ADMS device)
Forming hydrogen-free DLC films (hydrogen content below 1%) with unique technology, exhibiting excellent tribological properties in oil, and compatible with conductive carbon thin films.
Achieving a hydrogen-free DLC film (hydrogen content in the film below 1%) that is unprecedented in conventional production equipment. Utilizing a high-density plasma sputtering technology that does not use hydrogen in the film formation process, with a new type of PVD equipment (ADMS = Arc Discharge Magnetron Sputtering Device). The hydrogen-free dense DLC film reduces the sliding characteristics in Mo-added lubricants to less than 1/15 compared to conventional hydrogen-containing DLC films (from 1 to 0.06). The latest film formation process also accommodates the formation of conductive carbon thin films, expanding applications across a wide range of fields from biotechnology to new energy. The low-voltage, low-pressure plasma generated by the newly developed arc discharge magnetron cathode is applied not only for film formation but also for ion nitriding and etching of substrate surfaces, providing high-quality integrated processing from pre-treatment and substrate hardening to coating. The hydrogen-free DLC film (ADMS-CN film) produced by this device (arc discharge magnetron sputtering device) represents a new dry process that goes beyond traditional DLC (hard film formation), significantly broadening the possibilities of plasma surface treatment technology.
basic information
High-density plasma sputter cathode equipped with up to 4 targets. A large batch-type sputtering device suitable for mass production. Equipped with a substrate self-rotation mechanism that supports full coating of three-dimensional substrates, making it ideal for the production of small mechanical parts. Achieves excellent operability and stable operation through well-established mechanisms and control software, along with excellent interfaces such as data logging software. Optionally, it can be equipped with a conventional PIG-CVD mechanism. It supports a wide range of applications with a dual-type DLC coating device combining PVD and CVD. Consistent processing from substrate surface etching, ion nitriding, to hydrogen-free DLC film formation within the same batch. New type plasma surface treatment device.
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Applications/Examples of results
Automotive parts (sliding parts), fuel cell separators, etc.
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Shinko Seiki, as a technology-driven manufacturer, leverages the numerous know-how accumulated particularly in the field of vacuum equipment to deliver innovative products that meet user needs. In recent years, the company has also been challenging cutting-edge fields such as electronics and new materials, aiming to develop truly valuable hardware and software through the advancement of distinctive technologies and their organic integration.