Large substrate compatible equipment (film formation, etching, annealing)
Expansion to advanced packages: Processing is possible on a 510×515mm substrate.
We will provide a comprehensive proposal for the entire process from the previous stage to the next stage. (Film formation, etching/ashing, annealing) Since it is custom-made, we will propose cost-effective equipment that incorporates only the necessary functions.
basic information
●Film Formation We will propose an appropriate equipment configuration for production (such as load lock type, inline type, etc.). Custom upgrades are possible according to the required functions (heating chamber, cooling chamber, reverse sputtering chamber, etc.). ●Etching and Cleaning We will propose a stage shape tailored to the target substrate. Proposals for configurations suitable for applications (batch type, atmospheric transport type, etc.) are also possible. ●Annealing Batch processing using a multi-stage cassette. Processing in a clean environment managed for oxygen concentration is possible.
Price range
Delivery Time
Applications/Examples of results
- Support for advanced package substrates (interposers) - Expansion to large, irregular substrates - Support for bulk processing of individual pieces
