Achieving surface treatment close to vacuum RIE under atmospheric pressure! Atmospheric pressure plasma system.
【Exhibition Participation!】Ideal for surface modification of BGA substrates and lead frames! Achieves processing effects close to vacuum RIE plasma through the adoption of a unique system!
Our atmospheric pressure plasma system, which we handle, enables Ar plasma treatment that was difficult to achieve with conventional atmospheric pressure methods due to the adoption of a unique system. Additionally, the generation of ozone is significantly suppressed. Furthermore, by adopting a direct plasma method, we have achieved treatment effects close to those of vacuum RIE plasma. We can propose systems tailored to your desired processing form, such as magazine-to-magazine for lead frames, roll-to-roll, and sheet processing models. Please feel free to contact us. 【Main Effects】 - Surface activation - Organic matter removal - Nano-etching 【Examples of Applications】 - Surface modification of semiconductor lead frames before wire bonding - Cleaning of BGA substrates - Cleaning of film surfaces - Surface modification of mounting-related components *Sample demonstrations are available. Please feel free to contact us.
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