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61～90 item / All 100 items
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High Purity Hafnium (Hf) Target for Chemical Catalysts
Supports the optimization of catalytic reactions with high-purity Hf targets.
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High Purity Hf Target for Electronic Components
Dielectric films for electronic components. Improved reliability with high-purity Hf targets.
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Medical-grade Hafnium (Hf) Target
Support for improving the quality of contrast agents with high-purity Hf targets.
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Aerospace Hafnium (Hf) Target
High-purity Hf targets to improve heat resistance in the aerospace field.
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Hafnium (Hf) target for nuclear control rods
Improving the reliability of nuclear control rods with high-purity Hf targets.
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High Purity Hafnium (Hf) Target for Semiconductors
For semiconductor thin film formation. High-quality thin films with high-purity Hf targets.
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Tin (Sn) target for semiconductors
Tin (Sn) target purity ≧ 4N
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Iron (Fe) target Sputtering Target Vapor deposition material
Sputtering target Fe; Thin film deposition; Fe target evaporation source; Fe electron beam evaporation Fe; Fe pellet (for evaporation) high purity; Fe target (99.9%, 99.999%)
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Mono (Single) Crystal Silicon (Si) target
1‐0‐0 Single Crystal silicon; Circular silicon target; Laboratory research laboratory silicon high purity 9 N Resistance value≦0.01ohm/cm
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Polycrystalline silicon (Si) target
Poly-Silicon target supplier, Poly-Si target manufacturer, Multicrystalline silicon target price Used as components in devices such as CVD equipment, annealing furnaces, and diffusion furnaces! Polycrystalline silicon materials suitable for applications requiring high purity and thermal properties!
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Oxidized nickel (NiO) target
Resistive change memory (RRAM), transparent conductive films (TCO), gas sensors, and nickel oxide materials usable in spintronics!
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Niobium oxide (Nb2O5) target
Niobium oxide (Nb2O5) target
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V2O5 Vapor deposition materials, thin film electronic materials, Universities and research institutes develop materials
Vanadium oxide materials available for use in the RF sputtering process essential for the manufacturing of microelectronics components!
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Titanium dioxide (TiO2) target
Titanium oxide used in semiconductor manufacturing processes, recording media such as HDDs, and thin film formation for flat panel displays!
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Tin oxide (SnO) target
Used as an electrode, an important material that makes up the screen! As a transparent electrode, it enables touch operation on the screen, as well as for antistatic films and electromagnetic shielding films!
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Indium oxide (In2O3) target
Indium oxide materials suitable for use as electrode materials for voltage application in LCDs, organic ELs, plasma displays, and the like.
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Aluminum oxide (Al2O3) target
For the manufacturing of insulating films in chip production, as well as the production of other high-performance electronic components, sensors, solar panels, and surface modification of optical devices such as displays!
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Nickel-Copper (NiCu) Target
Alloy materials that can be used for semiconductor integrated circuits (VLSI), flat panel displays, optical discs, surface coatings, etc.
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Nickel-chromium (NiCr) target
Nickel-chromium that can be used for thin film formation, microelectronics manufacturing, Low-E films for architectural glass, liquid crystal panels, and recording media!
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Nickel-Vanadium (NiV) Target
Contributing to the manufacturing of integrated circuits (ICs) and the semiconductor and microelectronics industry! Nickel-vanadium materials capable of depositing high-quality thin films.
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Tungsten Titanium (W-Ti) Target
Tungsten-titanium materials that can be used as diffusion barriers and adhesives for metal wiring in microchip gate circuits.
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Indium Antimonide (IAO) Target
IAO materials are widely used in anti-static coatings and paints, significantly reducing static electricity accumulation and protecting the safety of equipment and people.
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Aluminum Neodymium (Al-Nd) Target
Aluminum neodymium materials suitable for wiring of flat panel displays, magnetic recording media, and magnetic sensors.
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Aluminum Titanium (Al-Ti) Target
Aluminum Titanium (Al-Ti) Target
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Aluminum Silicon (Al-Si) Target [Alloy Target]
In adjustment.
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SiO2 (quartz) ring
SiO2 (quartz) ring
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C18200(Cu) backing plate
Used as a backing plate, alloy material with hardness ≧ 1/2H!
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C18150(Cu) backing plate
Used as a backing plate, alloy material with hardness ≧ 1/2H!
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ITO (90:10; 95:5; 97:3...)Low-density ITO Target
Oxides that can be used as transparent electrodes and to control pixels without compromising the visual information of the screen!
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Zirconium (Zr) target
Zirconium (Zr) Target Purity>3N5 Hf<0.2wt% In Shipping...
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