Iron (Fe) target Sputtering Target Vapor deposition material
Sputtering target Fe; Thin film deposition; Fe target evaporation source; Fe electron beam evaporation Fe; Fe pellet (for evaporation) high purity; Fe target (99.9%, 99.999%)
■ Purity: 99.9% ~ 99.999% ■ Density (16.6 g/cm³) ■ Applications Thin film formation; superconducting materials; heat and corrosion resistant applications *For more details, please download the PDF or feel free to contact us.
basic information
■ Actual density>90% ■ Manufacturing method: vacuum melting method ■ Rust prevention treatment *For more details, please download the PDF or feel free to contact us.
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Applications/Examples of results
Thin film formation; Superconducting materials; Heat-resistant corrosion-resistant applications. Fe target magnetic properties Fe target thin film growth Fe target surface analysis
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Distributors
Our company has established a close cooperative relationship with Suzhou Techno-Tech Optoelectronic Materials Co., Ltd., a Japanese-affiliated company with a local factory in China that boasts world-class technology in sputtering targets and bonding services, along with engineers who have many years of experience. We are pursuing further evolution together. Through this collaboration, we propose high-quality and cost-effective products and services. We accurately capture customer needs and provide suitable and top-level products and services. Additionally, we offer cutting-edge products and technologies in semiconductor equipment, materials, and metal products through our extensive network cultivated over many years. Our company aims to support the development of our customers' businesses and grow together, maximizing creativity and technical capabilities to provide new value to our customers.