Tantalum (Ta) Target
Tantalum (Ta) Target Purity>5N
■Tantalum target materials are often used in PVD and CVD coating processes ■High temperature resistance and strong corrosion resistance ■High density Can be used for high-intensity sputtering, with high film deposition efficiency ■Good conductivity *For more details, please download the PDF or feel free to contact us.
basic information
■ High purity (99.999% 5N) ■ Uniform grain structure The uniformity of the crystalline grain coating film is ensured within the range of 40-60 μm, which is typically controlled ■ Processing of complex shapes is possible *For more details, please download the PDF or feel free to contact us.
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Applications/Examples of results
【Main Applications】 ■ Semiconductor and microelectronics industry ■ Optical and optoelectronic fields ■ Aerospace and high-temperature coatings ■ Medical equipment ■ Corrosion-resistant coatings *For more details, please download the PDF or feel free to contact us.
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Distributors
Our company has established a close cooperative relationship with Suzhou Techno-Tech Optoelectronic Materials Co., Ltd., a Japanese-affiliated company with a local factory in China that boasts world-class technology in sputtering targets and bonding services, along with engineers who have many years of experience. We are pursuing further evolution together. Through this collaboration, we propose high-quality and cost-effective products and services. We accurately capture customer needs and provide suitable and top-level products and services. Additionally, we offer cutting-edge products and technologies in semiconductor equipment, materials, and metal products through our extensive network cultivated over many years. Our company aims to support the development of our customers' businesses and grow together, maximizing creativity and technical capabilities to provide new value to our customers.