Hafnium (Hf) target
Hafnium (Hf) target Purity>4N5
■High-purity Hf target Application in the semiconductor industry GDMS with purity measurement values Under the regulatory environment, strictly follow the laws of each country and apply for a license to export ■ Available for civilian use *For more details, please download the PDF or feel free to contact us.
basic information
■ High purity and Grain Size Uniformity Purity ≥ 4N5 The purity of Hf catalyst for industrial use is usually ≥ 99.9% (3N) Purity>99.995% (4N5) Grain size (80 μ m) ensures the stability and consistency of film deposition ■ No defects inside Use UT testing to ensure that there are no defects inside *For more details, please download the PDF or feel free to contact us.
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Applications/Examples of results
【Main Applications】 ■ Semiconductor and Microelectronics Industry ■ Nuclear Industry ■ Aerospace and High-Temperature Coatings ■ Optical and Optoelectronic Fields ■ Medical and Biomaterials *For more details, please download the PDF or feel free to contact us.
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Distributors
Our company has established a close cooperative relationship with Suzhou Techno-Tech Optoelectronic Materials Co., Ltd., a Japanese-affiliated company with a local factory in China that boasts world-class technology in sputtering targets and bonding services, along with engineers who have many years of experience. We are pursuing further evolution together. Through this collaboration, we propose high-quality and cost-effective products and services. We accurately capture customer needs and provide suitable and top-level products and services. Additionally, we offer cutting-edge products and technologies in semiconductor equipment, materials, and metal products through our extensive network cultivated over many years. Our company aims to support the development of our customers' businesses and grow together, maximizing creativity and technical capabilities to provide new value to our customers.