SPUTTERCORE CO.,LTD. Official site

Tungsten (W) target for semiconductors

Improving sputtering efficiency with high-purity tungsten (W) targets.

In the semiconductor industry, sputtering is essential for the formation of high-quality thin films. Particularly as integration increases, the purity and uniformity of the target material become critical factors that influence device performance. Contamination by impurities and variations in film thickness can lead to reduced product yield and reliability issues. Our tungsten (W) targets achieve high purity (≧5N) and improve sputtering efficiency, addressing these challenges. 【Usage Scenarios】 - Thin film formation in semiconductor manufacturing - Manufacturing of high-density devices - Formation of metal films through sputtering 【Benefits of Implementation】 - Improved device performance through high-quality thin film formation - Enhanced yield - Realization of reliable products

Related Link - https://www.ttcm.co.jp/metals/tungsten-target

basic information

**Features** - High purity (3N5 to 5N) - Surface roughness ≦ Ra1.6a - Machining on all sides - Compatible with W alloy targets - Elimination of internal defects through UT inspection **Our Strengths** We have established a close cooperative relationship with a Japan-based local factory in China that possesses world-class technology in sputtering targets and bonding services. We provide high-quality, cost-effective products and services, prioritizing the development of our customers' businesses, and leveraging creativity and technical expertise to deliver new value.

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Applications/Examples of results

【Main Applications】 ■Semiconductors and Microelectronics ■Display Panels (OLED/LCD) ■Aerospace and Nuclear Industries ■Wear Resistance and Protective Coatings ■New Energy *For more details, please download the PDF or feel free to contact us.

Spatta Core Inc. Product Collection <Metal Targets>

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Tungsten (W) target [metal target]

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Our company has established a close cooperative relationship with Suzhou Techno-Tech Optoelectronic Materials Co., Ltd., a Japanese-affiliated company with a local factory in China that boasts world-class technology in sputtering targets and bonding services, along with engineers who have many years of experience. We are pursuing further evolution together. As a professional supplier with many years of experience in the target materials, we have selected a high-quality sputtering target material, and arranged the entire quality control system covering from warehouse to warehouse management, manufacturing, and quality inspection, and conducted a total lot of precision inspection to ensure the international high level of key indices such as purity, density and grain size. In addition, we acquire an export license necessary for the regulation material such as zirconium target (Zr), hafnium (HF), tungsten (W), tantalum (TA) and chromium (CR) for each order. Even if you change the policy of the destination country for the stable purchase, it understands the new regulatory policy, and it deals with sufficient stock, flexible production correspondence, and quick circulation. Even so far, the production schedule has not been delayed due to the influence of the export regulation, and the delivery rate of delivery can be 100%, and it can correspond to the urgent demand. We understand the importance of stable supply to our customers, and we will continue to improve inventory management and quality tracking system. Based on high quality target materials, we will continue to be the longest partner for our customers. Our company aims to support the development of our customers' businesses and grow together, maximizing creativity and technical capabilities to provide new value to our customers.