UHPLC column

Improve productivity! A lineup of columns that maximizes the performance of UHPLC systems.

Many of the LC columns currently available on the market cannot fully leverage the benefits derived from the performance of the latest UHPLC systems. Waters offers a variety of columns for UHPLC, such as CORTECS columns and eXtended Performance [XP] columns, to assist customers in overcoming challenges in their analyses. This expands the options for column selection and maximizes the potential of analytical laboratories. **Features** - CORTECS 2.7μm columns that utilize solid-core (core-shell) particles to maximize UHPLC separation performance - XP columns that use three types of particle substrates: ethylene-bridged hybrid (BEH), High Strength Silica (HSS), and Charged Surface Hybrid (CSH), providing excellent selectivity and flexibility in method development - Column sizes and particle diameters designed for UHPLC - Seamless method transfer between UPLC, UHPLC, and HPLC - Exceptional reproducibility between batches and columns through comprehensive management of the entire manufacturing process from silica and hybrid synthesis to the final product

Waters Reverse Phase Column Homepage

basic information

[CORTECS 2.7μm] ■Adopts solid core (core-shell) particles to maximize UHPLC separation performance ■Achieves high theoretical plates with low back pressure 　○Improves separation using long columns 　○Increases throughput by raising the mobile phase flow rate 　○Enhances separation performance in HPLC and UHPLC systems ■Expands the range of selectivity for method development with a chemistry lineup: C18, C18+, HILIC, C8, Phenyl ■Also offers 1.6μm for UPLC, allowing for easy method transfer [eXtended Performance (XP) Columns] ■XBridge BEH: A versatile column that supports a wide range of mobile phase pH and temperature conditions, enabling rapid and robust method development ■XSelect HSS: Maximizes retention with 100% silica that has high strength (particle pressure tolerance of 18000 psi) ■XSelect CSH: Superior peak shape for basic compounds through surface charge technology