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"Particle-PLUS" is a plasma analysis software suitable for simulations such as plasma reaction furnaces and chemical vapor deposition (CVD).

**Features** - The time scheme uses the implicit method, allowing for stable time evolution calculations over a large time step Δt compared to conventional methods. - The collision reaction model between neutral gas and electrons and ions employs the Monte Carlo Scattering method, enabling accurate and rapid calculations of complex reaction processes. - The neutral gas module determines the initial neutral gas distribution used in the above plasma module, allowing for quick evaluation of gas flow using the DSMC method. - The sputtered particle module calculates the behavior of atoms sputtered from the target in plasma and neutral gas environments, such as the flux distribution on the opposing substrate, which can be evaluated in a short time. - For other functions and details, please refer to the catalog.

Analysis of gas flow under low pressure conditions; analysis software compatible with rarefied gases (rarefied fluids).

**Features** - A simulation software for rarefied fluid using the particle method, useful for experiments and equipment development using vacuum chambers. - Capable of simulating film deposition that includes chemical reactions such as CVD. - Adopts unstructured meshes, allowing calculations that directly reflect the actual shape of the equipment. - High parallel efficiency enables quick computation results even for large-scale shapes. - Unlike fluid models, the particle method ensures convergence to a solution even with poor quality computational grids. - Comprehensive technical support allows beginners in simulation and those busy with experiments to reliably obtain results. - For other features and details, please refer to the catalog.

This software was developed by Professor Raja, an expert in plasma simulation at the University of Texas at Austin.

The feature of VizGlow is that it adopts a compressible fluid model, allowing for plasma analysis under various conditions. Types of plasma that can be simulated: - Capacitively Coupled Plasma (CCP) - Inductively Coupled Plasma (ICP) - Microwave Plasma (MWP) - Direct Current (DC) Plasma - Atmospheric Pressure Plasma (APP) - Microdischarge (MD)