テルモセラ・ジャパン株式会社 本社 Official site

◉ nanoETCH Soft Etching Device

MiniLab Series Experimental Equipment

◉ 【MiniLab-026】Small Vacuum Deposition Device

◉ 【MiniLab-060】Flexible Thin Film Experimental Device

◉ 【MiniLab-080】Flexible Thin Film Experimental Device

◉ 【MiniLab-090】Flexible Thin Film Experimental Device

MiniLab-026/090 Glove Box Thin Film Experiment Device

□■□Thin Film Experiment Device (Compact Type)□■□

◉ nanoPVD-S10A Magnetron Sputtering Device

◆nanoPVD-T15A◆ High-performance organic and metal film deposition device

◆ANNEAL◆ Wafer Annealing Equipment

◉ nanoCVD-8G/8N Graphene/CNT Synthesis Device

◉ Nanofurnace "BWS-NANO" Thermal CVD Device

◇◆Film-Forming Component◆◇

Ultra-High Temperature Small Experimental Furnace Series

◉ Mini-BENCH Ultra High Temperature Small Tabletop Experimental Furnace Max 2200℃

◉ TCF-C500 Ultra High Temperature Small Experimental Furnace Max 2900℃

● MiniLab-WCF Ultra-High Temperature Wafer Annealing Furnace 2200℃

◆◇◆ Small Vertical Experimental Furnace for R&D TVF-110 ◆◇◆

□■□ Substrate Heating Heater □■□

◉ BH Series substrate heating heater Max 1600℃

◉ SH series substrate heating heater Max 1100℃

◉ Hot stage "Substrate heating mechanism" Max 1800℃

◆HTE Heater◆ High Vacuum Crucible Heating Heater Max 1500℃

Temperature Sensor

Infrared thermometer measuring device

◉ Small, high-precision infrared radiation temperature sensor

◉ USB connection type, variable emissivity high-temperature infrared radiation temperature sensor

◉ Intrinsically Safe Explosion-Proof Infrared Radiation Temperature Sensor

◉ Smartphone-configured infrared radiation temperature sensor