Plasma Quest Limited Company Introduction
Remote source ion beam sputtering device manufacturer for remote plasma sources.
PlasmaQuest is a reputable company with a 25-year history in the development and sales of helicon-type high-density ion sources and related application products. The gridless helicon plasma source generates high-density plasma and continues to provide OEM supply to many equipment manufacturers. Utilizing this high-quality plasma source as an ion source, the groundbreaking "HiTUS" system applies bias to the target, enabling sputtering under various conditions and with different targets. It allows for sputtering of high magnetic targets and high dielectric targets, which are considered difficult with conventional magnetron sputtering devices, as well as co-sputtering using heterogeneous targets such as metals and ceramics, making it suitable for a wide range of applications. The company is equipped to flexibly respond to both research applications and production-scale equipment.
basic information
Development and manufacturing of high-density ion sources Development and manufacturing of sputtering equipment with target bias application
Price range
Delivery Time
Model number/Brand name
Manufacturer of high-density plasma ion sources and ion beam sputtering devices.
Applications/Examples of results
Research on spintronics applications Research on high magnetic thin film head applications Research on MEMS development Research on optical thin films
News about this product（2）
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Information on commissioned test film formation services (test film formation of high-quality reaction films, etc.)
Research on Co-sputtering of different materials, such as ferromagnetic targets and metal and ceramic targets, which are considered difficult to film using conventional sputtering devices. We strongly support advanced material research and process development, including the deposition of AlScN, which is attracting attention for next-generation MEMS applications. This is a groundbreaking technology that uses a helicon ion source as a plasma source, accelerating high-density ions obtained from it by applying a bias voltage to the target. Since it is an ion beam-type deposition method using a remote plasma system, stable film formation can be achieved even with ferromagnetic and dielectric targets, which are challenging for magnetron sputtering devices. By individually controlling the ion source and target application, it is possible to accommodate a wide range of deposition conditions while also achieving high deposition rates. Independent gas supply near the target and substrate allows for the deposition of various multilayer thin films, including oxide and nitride films. Since the substrate surface is not exposed to plasma, it is possible to maintain a low temperature during film formation.
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We will exhibit at the MEMS Engineer Forum 2025.
The MEMS Engineer Forum is a unique forum operated primarily by engineers among the key players in MEMS technology, which is considered a key technology of the 21st century. At this forum, where MEMS researchers, developers, and engineers from around the world gather, we will introduce and showcase the Remote Plasma Ion Beam Sputtering System manufactured by Plasma Quest Ltd. This is an excellent opportunity to see cutting-edge technologies related to MEMS, not only from our exhibition but also from others. We cordially invite you to attend. Venue: International Fashion Center Hall 1-6-1 Yokogawa, Sumida-ku, Tokyo 130-0015, Japan Access: https://www.tokyo-kfc.co.jp/access/ Exhibited Product: Remote Plasma Ion Beam Sputtering System by Plasma Quest Ltd. https://mono.ipros.com/product/detail/2001148974 https://www.plasmaquest.com/
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For semiconductor, electronic devices, and optical thin film manufacturing equipment, come to us. Our company was established in March 2016 with the aim of providing agency services for several overseas manufacturers with advanced technologies related to vacuum processes, as well as maintenance services for these devices. Our product lineup includes a wide range of equipment such as sputtering, high-density plasma sources and pulse power supplies, ion beam etching and milling, ion beam sputtering, neutral cluster ion beam process equipment, organic material sublimation purification and film deposition equipment, various filters for liquids, and cleaning brushes, among others.