ULTRA-SOL

ULTRA-SOL
We offer a variety of high-performance slurries that can be used in the CMP process after diamond polishing. We have developed slurries using colloidal silica, cerium oxide, and aluminum oxide through our unique technology.
1~2 item / All 2 items
-
Pre-CMP slurry: Reducing CMP process time
Softly controlling the hard! A slurry for polishing hard substrates blended with silica and diamond. By using it before CMP, it shortens the process time.
last updated
-
Optical material series "ULTRA-SOL OPTIQPRO"
Slurry for precision polishing of optical materials using high-purity cerium oxide. Recommended for those who require high cleanliness and surface quality.
last updated