Pre-CMP slurry: Reducing CMP process time

Softly controlling the hard! A slurry for polishing hard substrates blended with silica and diamond. By using it before CMP, it shortens the process time.

This is a recommended pre-CPM slurry for polishing hard materials such as sapphire, SiC, and silicon nitride. By using it before CMP, you can shorten the CMP process time. 【Recommended for the following situations】 ■ Those who want to shorten the CMP process time ■ Those who want to efficiently remove fine scratches, etc. ■ Those who want to reduce the load of potassium permanganate slurry *For more details, please feel free to contact us.

basic information

The pre-CMP slurry ULTRA-SOL STD0.5μ20MCH is a neutral pH aqueous slurry blended with high-quality diamond particles and silica. By using it before CMP, it can shorten the CMP process time for difficult-to-process materials such as sapphire, SiC, and silicon nitride. 【Introduction to ULTRA-SOL STD0.5μ20MCH products is now available】 We have created a document summarizing evaluation examples of SiC using ULTRA-SOL STD0.5μ20MCH. For more details, please refer to the catalog at the bottom of the page! *Pre-CMP slurry is a slurry blended with single crystal diamond and colloidal silica. By attacking the surface with diamond abrasives and smoothing it with colloidal silica, it achieves a high processing rate and surface quality. Using it before finishing CMP significantly reduces process time.