Metal composite material grinding pad "IRINO": Enhancing the performance of existing grinding machines.
Achieves high polishing rates and excellent surface finish on materials such as SiC and sapphire!
At Pureon, we propose a rapid thinning process that combines IRINO-PROSiC and diamond slurry PURE-DS-RT for high-speed grinding of SiC wafers, achieving significant cost reductions compared to conventional processing methods. This innovative combination not only ensures excellent surface quality but also guarantees a high processing rate, making it suitable for applications that require a smooth transition to the CMP process. The back side features a self-adhesive tape, allowing IRINO-PROSiC to be easily attached to existing metal plates, enhancing the usability and efficiency of SiC grinding tools. Whether you seek superior surface quality or high processing rates, IRINO-PROSiC is the ideal product for advanced SiC processing. 【Features】 ■ Innovative grinding pad suitable for the Rapid Thinning process ■ Optimal for grinding SiC ■ Surface finish at Ra 1 nm level ■ Highly competitive compared to conventional grinding processes ■ Flat finish that does not cause edge surface degradation ■ Usable on single-sided/double-sided polishing machines with flat plates (dressing required)
basic information
【Product Specifications】 - Thickness: 1mm - Bonding Material: Resin Bond - Carrier Material: Polycarbonate - Diameter: 200 to 1,200 mm *Sizes larger than this will be provided in multiple pieces that are bonded together. - Back Processing: Self-adhesive tape
Price range
Delivery Time
Model number/Brand name
IRINO-PRO-SiC
Applications/Examples of results
■Main Uses SiC Wafer
Related Videos
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Download All CatalogsNews about this product(5)
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We will exhibit at the SiC, GaN Processing Technology Exhibition 2025!
At the SiC and GaN Processing Technology Exhibition 2025, you can see diamond grinding pads and metal composite pads at the Pure on Japan booth! 【Event Overview】 ■ Dates: March 5 (Wednesday) to March 7 (Friday), 2025, 10:00 AM to 5:00 PM ■ Venue: Makuhari Messe, Exhibition Hall 8 (2-1 Nakase, Mihama-ku, Chiba City, Chiba Prefecture) ■ Admission Fee: Free (Pre-registration required) ■ Booth Number: S-16 【Exhibited Products】 ・Resin bond diamond grinding pad "SQUADRO-G2" ・Metal bond diamond grinding pad "PLATO" ・Metal composite pad "IRINO-PROSiC" ・"PAD-EASE-PRO" for easy attachment and detachment of pads ・Ultra-fine diamond manufacturing technology for mechanical fine processing We will showcase a variety of grinding and polishing products for SiC, GaN, and other materials, focusing on "pads that can easily replace loose abrasive processing equipment with fixed abrasives" and "nano-sized diamonds for finishing polishing of difficult-to-CMP materials." We invite everyone to come and visit us!
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You can see our products at the High-Performance Ceramics Exhibition (CERAMIC JAPAN)!
At the booth of Mabuchi S&T Co., Ltd., a general trading company for materials and equipment related to optics and electronics, you can see the following products: - SQUADRO: A diamond grinding pad that can be attached to the base plate of existing equipment, eliminating detachment! - PLATO: A diamond grinding pad characterized by high grinding performance and long lifespan! Recommended as a substitute for waterproof abrasive paper. - IRINO: A composite pad of copper and resin recommended for processing ultra-hard materials such as SiC and sapphire. - IC OPTIC Puck: A polyurethane block for polishing optical materials. We sincerely look forward to your visit. Mabuchi S&T Co., Ltd. website https://www.mabuchist.co.jp/
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We have published examples of SiC wafer processing!
At Pureon, we are collaborating with major next-generation power semiconductor manufacturers in Europe and the United States to contribute to the development of EVs. In the following case book, we will introduce examples of slicing SiC ingots and wafer processing used in next-generation power semiconductors. If you are having trouble with processing SiC or GaN, please feel free to consult us. ★ Streamlining the slicing of SiC ingots using a multi-wire saw! https://premium.ipros.jp/pureon/catalog/detail/656418/?hub=165&categoryId=59887 ★ Reducing processing time for SiC wafers and minimizing defective products! https://premium.ipros.jp/pureon/catalog/detail/646885/?hub=165&categoryId=59887 Additionally, these products have been featured in the overseas semiconductor industry magazine "Compound Semiconductor." https://premium.ipros.jp/pureon/news/detail/95752/?hub=160
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Our products for SiC have been featured in the magazine "Compound Semiconductor"!
Our products have been featured on the cover of the globally acclaimed magazine "Compound Semiconductor," which is widely read in the semiconductor industry. The article introduces products for the next-generation semiconductor "SiC (Silicon Carbide)," which is gaining attention for its high power and miniaturization in electronics, starting with electric vehicles. Although it's in English, please feel free to take a look: https://compoundsemiconductor.net/article/114825/The_Secret_Sauce_Of_Silicon_Carbide We also welcome inquiries regarding our products for SiC. Please feel free to contact us.
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Pure On Japan Co., Ltd. has renewed its company profile!
Due to the change of our company name and the relocation of our office, we have completely renewed our company brochure. It includes introductions to our new products and our factory. If you wish, please download it from the catalog page for your use. ----- Micro Diamond, which has contributed to customers through precision classification, has acquired the American CMP-related company Eminess Technology and has become Pureon. In addition to our high-quality diamond-related products, we will also accumulate know-how regarding final finishing CMP in-house. What is important for our customers is the final finish. Even now, we receive inquiries about our diamond polishing with the aim of shortening the CMP process time. In the future, we will comprehensively accept consultations from grinding and polishing to CMP.