Sputtering Device QKG-Sputtering
Film formation completed without exposure to the atmosphere in full auto! ~Sample measurement in progress!~
The conventional sputtering devices struggled with "film formation of multiple materials within a single badge," but this has been made possible by adopting a work mask, allowing the film formation to be completed in full auto mode without exposing the samples to the atmosphere. - Space-saving benefits for the workspace - Increased reproducibility of film formation - Reduced man-hours, decreased errors, and improved morale - Full auto film formation with one button → efficiency benefits - Cost reduction in materials with a 1-inch cathode Please consult us for jigs and customizations to achieve high-precision sputtering.
basic information
Device Configuration: Film deposition chamber main body, standalone control panel, chiller, compressor Processing Method: Batch processing Sputter Source: Magnetron type φ25mm × 5 *For details, please refer to the back of the catalog.
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Applications/Examples of results
Applications: Organic EL, solar cells, optical components, bio, semiconductors, electronic components, automobiles, resins, special films, MEMS, etc.
