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For reducing man-hours and costs! Capable of various simulations such as thin film generation, sputtering, and plasma etching. Support after implementation is also reliable.

【Other Features】 ■ A simulation software for dilute fluid using particle methods, useful for experiments and equipment development using vacuum chambers. ■ Capable of simulating film deposition that includes chemical reactions such as CVD. ■ Adopts unstructured mesh, allowing calculations to be performed with the actual shape of the equipment. ■ High parallel efficiency enables quick computation results even for large-scale shapes. ■ Unlike fluid models, the use of particle methods ensures convergence to a solution even with poor quality computational grids. ■ Comprehensive technical support allows beginners in simulation and those busy with experiments to reliably achieve results. ◆ Outputs Various Calculation Results ◆ - Calculation of chemical reactions - Calculation of chemical reactions from Arrhenius-type reaction data - Calculation of dissociation, recombination, and molecular (atomic) exchange reactions - Ability to set multiple reaction equations on the GUI - Film deposition rate distribution - Density distribution of electrons and ions - Distribution of radical and excited species generation - Ion flux distribution - Erosion rate distribution, etc. * For more details, please refer to the materials. Feel free to contact us with any inquiries.

Analysis of gas flow under low pressure conditions; analysis software compatible with rarefied gases (rarefied fluids).

【Features】 ● A simulation software for dilute fluid using the particle method, useful for experiments and equipment development using vacuum chambers. ● Capable of simulating film deposition rates and distributions that include chemical reactions such as CVD. ● Adopts unstructured meshes, allowing calculations to be performed based on the actual shape of the equipment. ● High parallel efficiency enables quick computation results even for large-scale shapes. ● Since it uses the particle method, unlike fluid models, it can achieve convergent solutions even with poor quality computational grids. ● With comprehensive technical support, even those new to simulations or busy with experiments can reliably obtain results. ● For other features and details, please refer to the catalog.

"Particle-PLUS" is a plasma analysis software suitable for simulations such as plasma reaction furnaces and chemical vapor deposition (CVD).

**Features** - The time scheme uses the implicit method, allowing for stable time evolution calculations over a large time step Δt compared to conventional methods. - The collision reaction model between neutral gas and electrons and ions employs the Monte Carlo Scattering method, enabling accurate and rapid calculations of complex reaction processes. - The neutral gas module determines the initial neutral gas distribution used in the above plasma module, allowing for quick evaluation of gas flow using the DSMC method. - The sputtered particle module calculates the behavior of atoms sputtered from the target in plasma and neutral gas environments, such as the flux distribution on the opposing substrate, which can be evaluated in a short time. - For other functions and details, please refer to the catalog.

This is simulation software that makes it possible to analyze the arc plasma of automotive spark plugs, which was previously difficult.

VizSpark not only considers the characteristics of arc plasma but also takes into account conjugate heat transfer and coupling with flow, making it possible to utilize it for a wide range of purposes. By using VizSpark, you can analyze the heat generated by arc plasma, the pressure and temperature rise associated with heating, as well as the energy efficiency of the arc plasma.

Dilute fluid analysis software 'DSMC-Neutrals' that also supports 'shower head type CVD' analysis.

**Features** - A simulation software for dilute fluid using the particle method, useful for experiments and device development using vacuum chambers. - Capable of simulating film formation that includes chemical reactions such as CVD. - Adopts unstructured meshes, allowing calculations to be performed using the actual shape of the device. - High parallel efficiency enables quick computation results even for large-scale shapes. - Unlike fluid models, the particle method guarantees convergence solutions even with poor quality computational grids. - With comprehensive technical support, even those new to simulation or busy with experiments can reliably achieve results. - For other functions and details, please contact us.

This is simulation software that makes it possible to analyze arc plasma in automotive spark plugs, which was previously difficult.

VizSpark not only considers the characteristics of arc plasma but also takes into account conjugate heat transfer and coupling with flow, making it possible to utilize it for a wide range of purposes. By using VizSpark, you can analyze the heat generated by arc plasma, the pressure and temperature rise associated with heating, as well as the energy efficiency of the arc plasma.

This software was developed by Professor Raja, an expert in plasma simulation at the University of Texas at Austin.

The feature of VizGlow is that it adopts a compressible fluid model, allowing for plasma analysis under various conditions. Types of plasma that can be simulated: - Capacitively Coupled Plasma (CCP) - Inductively Coupled Plasma (ICP) - Microwave Plasma (MWP) - Direct Current (DC) Plasma - Atmospheric Pressure Plasma (APP) - Microdischarge (MD)

For simulating gas flow and thin film formation. Short computation time even for large shapes.

【Other Features】 - A simulation software for dilute fluid using the particle method, useful for experiments and equipment development using vacuum chambers. - Capable of simulating film formation that includes chemical reactions such as CVD. - Adopts unstructured mesh, allowing calculations to be performed with the actual shape of the equipment. - High parallel efficiency enables quick computation results even for large-scale shapes. - Unlike fluid models, the particle method ensures convergence to a solution even with poor quality computational grids. - Comprehensive technical support ensures that even those new to simulation or busy with experiments can reliably achieve results. ◆ Outputs Various Calculation Results ◆ - Calculation of chemical reactions - Calculation of chemical reactions from Arrhenius-type reaction data - Calculation of dissociation, recombination, and molecular (atomic) exchange reactions - Ability to set multiple reaction equations on the GUI - Film deposition rate distribution - Density distribution of electrons and ions - Generation distribution of radicals and excited species - Ion flux distribution - Erosion rate distribution, etc. *For more details, please refer to the documentation. Feel free to contact us with any inquiries.