"Before the resin encapsulation of semiconductors." We have added a page to the technical document titled "Why Did the 'Silent Evolution' Occur?" The article provides a detailed explanation of the basic concepts of semiconductor resin encapsulation, as well as specific approaches to surface treatment that are key to maximizing quality. Additionally, the technical document systematically organizes the mechanisms behind the deterioration of insulation and the instability of resin bonding strength, and explains advanced insights into surface design and cleaning technologies that are essential for high-reliability devices. We encourage you to read it.

Flux residues require the selection of analytical methods based on their type. By conducting chemical analysis, it is possible to analyze the causes of defects and improve processes. You can download a free document summarizing our analysis service overview. If you are struggling with cleaning processes or defect analysis, please take a look. Zestron offers cleanliness analysis technology that can comply with ISO 9455-18:2024.

This is the updated version (ver.2) of the popular document "Fundamentals of Flux Cleaning." In this revision, in addition to the existing content (how to choose cleaning agents and cleaning methods), we have added the basics of "Residue Evaluation (Analysis)." This document is recommended for those who are just starting with flux cleaning and for those who want to understand the entire process from cleaning to analysis. In addition to the purpose of cleaning and the fields where cleaning is necessary, we also explain the necessity and methods of chemical analysis, so please take a moment to read it.