Standard models of nano-precision positioning stages, four types.

We offer a lineup of standard models for wafer white light interference measurement, PLP inspection, LDI exposure machines, and wafer optical inspection.

This is a linear motor stage with nanometer precision that can be utilized in the advanced processes of semiconductor manufacturing, where technological advancements are progressing. It is suitable for semiconductor inspection equipment and semiconductor manufacturing equipment with stringent technical requirements. By introducing standard models, we provide solutions that shorten our customers' development periods. Our company offers a wide range of in-house components, allowing us to secure all parts and engineers internally, enabling us to achieve design and production lead times that cannot be matched by other companies. We are equipped with three elements: <mechanical component parts>, <mechatronic products>, and <control technology>, allowing us to respond flexibly and quickly not only to standard models but also to custom requests.

Nano Precision Positioning Stage Special Page

basic information

■ Wafer White Light Interference Measurement Model Applicable to 12-inch wafer measurement equipment. High servo stability and high magnification visual measurement. Short delivery time. ■ PLP Inspection Model Hybrid structure with air bearings and linear guideways, combining high precision and high rigidity. Short delivery time. ■ LDI Exposure Machine Model High-grade air bearing stage. High dynamic stability and dynamic precision, capable of maintaining consistently high accuracy. ■ Wafer Optical Inspection Equipment Applicable for inspection of 8-inch wafers and AOI equipment. A versatile stage with high stability and short delivery time.