Sampling techniques for the analysis of microscopic foreign substances
We will report rapid analysis results using various sampling techniques regarding foreign substances that significantly impact the yield of electronics products.
■Special Sampling Techniques for Foreign Substances in Multilayer Films - Foreign substances buried in metal films on substrates Metal film etching ⇒ Transfer to Si wafer ⇒ FT-IR analysis - Foreign substances in multilayer films Cutting off the surface layer ⇒ Transfer to Si wafer ⇒ FT-IR analysis Microtome/FIB thinning ⇒ Transfer to Si wafer ⇒ FT-IR analysis
basic information
■Further enhanced micro-sampling tool The newly introduced micro-sampling tool captures targeted foreign substances accurately using a manipulator under a microscope. ■Even microscopic foreign substances less than 5 micrometers can be collected in large quantities and measured using FT-IR.
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Applications/Examples of results
Special sampling technique for foreign substances in multilayer films.
