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Cross-section polishing (CP) method for cross-sectional observation service.

Achieve high processing precision and a wide processing area! Machining is also possible while reducing damage with cooling functions.

The CP method allows for the observation of cross-sections without damage from polishing, compared to mechanical polishing methods. Our triple ion milling device with cooling function achieves high processing precision and a wide processing area through ion beams irradiated from three directions. For materials sensitive to heat, processing can be done while reducing damage with the cooling function. 【Features】 ■ Capable of processing over a wide range with a processing width of approximately 4mm and a processing depth of about 1mm ■ High flatness in both hard and soft materials, enabling the production of cross-sections without physical damage ■ Capable of producing cross-sections with good positional accuracy ■ Processing can be done while cooling (cryogenic) *For more details, please refer to the PDF document or feel free to contact us.

Related Link - https://www.ites.co.jp/section/index/%e8%a6%b3%e5%…

basic information

【Device Specifications】 ■ Triple Ion Milling Device with Cooling Function - Maximum Sample Size: 50×50×10mm - Maximum Processing Width: 4mm - Pinpoint Position Accuracy: 10–20μm - Cooling Function: Down to -150℃ *For more details, please refer to the PDF document or feel free to contact us.

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Applications/Examples of results

For more details, please refer to the PDF document or feel free to contact us.

Total support service for cross-section grinding, processing, observation, and analysis.

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Cross-section polishing (CP) method for cross-sectional observation service.

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Cross-sectional observation by SEM: Connector plating

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[Data] Structural Analysis of MEMS Components

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Observation of the coating film

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[Dataset] LCD Panel Analysis Dataset

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CP processing device Arblade5000_ Wide Area Cross-section Milling

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Cryogenic ion milling cross-section processing example (rubber products)

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Effects of heat generated during cross-sectional ion milling (CP) processing.

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Aites was established in 1993, originating from the quality assurance department of the IBM Japan Yasu office. Based on the technical expertise cultivated through cutting-edge defect analysis and reliability assurance of electronic components at the IBM Japan Yasu office, we have provided various products and services that support the development and manufacturing of semiconductors, displays, organic EL, solar cells, and electronic components to customers both domestically and internationally.